Sputtering process is a process for making thin film on works or substrates by physical vapor deposition (PVD) in vacuum system. The process uses concept of momentum transfer whereby surface of solid target material is bombarded by particles having kinetic energy. Atoms of solid target surface will fall and bounce off from surface because of crashing between surface atoms and kinetic energy particles. Then atoms of solid target surface will make thin film on the substrate (purpose work).
Concept of Thin film process by Sputtering
We can call a sputtering process as a state of the art of technology which create thin film of metals or elements and get the high end of quality product. The sputtering system has been developed and improved with different technics for over 80 years. It was improved for higher coating rate, getting pure thin film without impurity and in order to secure the adhesion of thin film. Because of these reasons, window film manufacturers always use this process.
Advantages of sputtered films.
- Sputtered thin films are beautiful, smooth, neat and unruffled.
- Be able to control thin film thickness accurately and control characteristics widely.
- Thin film has very low defects when compared with other processes so it is suitable for high end product manufacturing.
- Sputtered films have very high efficiency for rejecting solar heat radiation.
- - Sputtered films have characteristic of reflecting reduction when looking from cabin, so you will look to outside clearer than normal films.